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The dependence of stress induced voiding on line width studied by conventional and high resolution resistance measurements

dc.contributor.authorWitvrouw, Ann
dc.contributor.authorMaex, Karen
dc.contributor.authorDe Ceuninck, Ward
dc.contributor.authorLekens, Geert
dc.contributor.authorD'Haen, Jan
dc.contributor.authorDe Schepper, Luc
dc.date.accessioned2021-10-01T09:48:45Z
dc.date.available2021-10-01T09:48:45Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3157
dc.sourceIIOimport
dc.titleThe dependence of stress induced voiding on line width studied by conventional and high resolution resistance measurements
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorDe Ceuninck, Ward
dc.contributor.imecauthorLekens, Geert
dc.contributor.imecauthorD'Haen, Jan
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1035
dc.source.endpage1041
dc.source.journalMicroelectronics Reliability
dc.source.issue6_8
dc.source.volume38
imec.availabilityPublished - open access


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