dc.contributor.author | Rackauskas, Ben | |
dc.contributor.author | J. Uren, Michael | |
dc.contributor.author | Stoffels, Steve | |
dc.contributor.author | Zhao, Ming | |
dc.contributor.author | Bakeroot, Benoit | |
dc.contributor.author | Decoutere, Stefaan | |
dc.contributor.author | Kuball, Martin | |
dc.date.accessioned | 2021-10-26T01:45:36Z | |
dc.date.available | 2021-10-26T01:45:36Z | |
dc.date.issued | 2018 | |
dc.identifier.issn | 0741-3106 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/31583 | |
dc.source | IIOimport | |
dc.title | The impact of Ti/Al contacts on AlGaN/GaN HEMT vertical leakage and breakdown | |
dc.type | Journal article | |
dc.contributor.imecauthor | Stoffels, Steve | |
dc.contributor.imecauthor | Zhao, Ming | |
dc.contributor.imecauthor | Bakeroot, Benoit | |
dc.contributor.imecauthor | Decoutere, Stefaan | |
dc.contributor.orcidimec | Zhao, Ming::0000-0002-0856-851X | |
dc.contributor.orcidimec | Bakeroot, Benoit::0000-0003-4392-1777 | |
dc.contributor.orcidimec | Decoutere, Stefaan::0000-0001-6632-6239 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1580 | |
dc.source.endpage | 1583 | |
dc.source.journal | IEEE Electron Device Letters | |
dc.source.issue | 10 | |
dc.source.volume | 39 | |
dc.identifier.url | https://ieeexplore.ieee.org/document/8450043 | |
imec.availability | Published - imec | |