dc.contributor.author | Rutigliani, Vito | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Rispens, Gijsbert | |
dc.contributor.author | Papavieros, George | |
dc.contributor.author | Gogolides, Evangelos | |
dc.contributor.author | Costantoudis, Vassilios | |
dc.contributor.author | Mack, Chris | |
dc.date.accessioned | 2021-10-26T02:55:48Z | |
dc.date.available | 2021-10-26T02:55:48Z | |
dc.date.issued | 2018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/31693 | |
dc.source | IIOimport | |
dc.title | Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Rispens, Gijsbert | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 105851K | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXXII | |
dc.source.conferencedate | 25/02/2018 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | https://doi.org/10.1117/12.2297264 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 10585 | |