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Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations

dc.contributor.authorRonse, Kurt
dc.contributor.authorPforr, Rainer
dc.contributor.authorBaik, Ki-Ho
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T12:46:10Z
dc.date.available2021-09-29T12:46:10Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/316
dc.sourceIIOimport
dc.titleAttenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage133
dc.source.endpage138
dc.source.journalMicroelectronic Engineering
dc.source.volume23
imec.availabilityPublished - open access
imec.internalnotesPaper from the Microelectronic Engineering Conference; Sept. 1993; Maastricht, The Netherlands


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