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EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems

dc.contributor.authorSah, Kaushik
dc.contributor.authorCross, Andrew
dc.contributor.authorPlihal, Martin
dc.contributor.authorAnantha, Vidyasagar
dc.contributor.authorBabulnath, Raghav
dc.contributor.authorFung, Derek
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHalder, Sandip
dc.date.accessioned2021-10-26T03:03:40Z
dc.date.available2021-10-26T03:03:40Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31705
dc.sourceIIOimport
dc.titleEUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems
dc.typeProceedings paper
dc.contributor.imecauthorSah, Kaushik
dc.contributor.imecauthorCross, Andrew
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1080909
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate17/09/2018
dc.source.conferencelocationMonterey USA
dc.identifier.urlhttps://doi.org/10.1117/12.2501825
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10809


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