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Cleaning the high aspect ratio STI structures for advanced logic devices by implementation of a surface modification drying technique
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Cleaning the high aspect ratio STI structures for advanced logic devices by implementation of a surface modification drying technique
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Date
2018
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sebaai, Farid
;
Vereecke, Guy
;
Xu, XiuMei
;
Baudot, Sylvain
;
Amemiya, Fumihiro
;
Komori, Kana
;
Holsteyns, Frank
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2100
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Acq. date: 2026-01-11
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Views
2100
since deposited on 2021-10-26
2
last month
1
last week
Acq. date: 2026-01-11
Citations