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ESD performance comparison of superlattice I/O FinFET and horizontal nanowire devices

dc.contributor.authorSimicic, Marko
dc.contributor.authorChen, Shih-Hung
dc.contributor.authorHellings, Geert
dc.contributor.authorLinten, Dimitri
dc.date.accessioned2021-10-26T03:50:52Z
dc.date.available2021-10-26T03:50:52Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31778
dc.sourceIIOimport
dc.titleESD performance comparison of superlattice I/O FinFET and horizontal nanowire devices
dc.typeProceedings paper
dc.contributor.imecauthorSimicic, Marko
dc.contributor.imecauthorChen, Shih-Hung
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.orcidimecSimicic, Marko::0000-0002-3623-1842
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageB.5
dc.source.conference12th International Electrostatic Discharge Workshop- IEW
dc.source.conferencedate14/05/2018
dc.source.conferencelocationCorsendonk Belgium
dc.identifier.urlhttps://www.esda.org/assets/IEW/2018IEWProgram.pdf
imec.availabilityPublished - open access


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