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Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination

dc.contributor.authorRonse, Kurt
dc.contributor.authorPforr, Rainer
dc.contributor.authorBaik, Ki-Ho
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T12:46:12Z
dc.date.available2021-09-29T12:46:12Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/317
dc.sourceIIOimport
dc.titleExtending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage3783
dc.source.endpage3792
dc.source.journalJ. Vac. Sci. Technol. B
dc.source.issue6
dc.source.volume12
imec.availabilityPublished - imec


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