Authors

Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc

Issue

6

Journal

J. Vac. Sci. Technol. B

Volume

12

Title

Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination

Publication type

Journal article