Publication:
Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
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1999 since deposited on 2021-09-29
Acq. date: 2025-10-24
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Views
1999 since deposited on 2021-09-29
Acq. date: 2025-10-24
Citations