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Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination

Date

1994
Journal article
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dc.contributor.authorRonse, Kurt
dc.contributor.authorPforr, Rainer
dc.contributor.authorBaik, Ki-Ho
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-09-29T12:46:12Z
dc.date.available2021-09-29T12:46:12Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/317
dc.source.beginpage3783
dc.source.endpage3792
dc.source.issue6
dc.source.journalJ. Vac. Sci. Technol. B
dc.source.volume12
dc.title

Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination

dc.typeJournal article
dspace.entity.typePublication
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