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Implementation of a novel silicon heterojunction IBC process flow using partial etching of doped a-Si:H with efficiencies close to 23%
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1881 since deposited on 2021-10-26
2last month
Acq. date: 2026-01-09
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Metrics
Views
1881 since deposited on 2021-10-26
2last month
Acq. date: 2026-01-09
Citations