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Bottom-up nanoelectronic device fabrication by Area-Selective Deposition

dc.contributor.authorSoethoudt, Job
dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorSanz-Matias, Ana
dc.contributor.authorHarvey, Jeremy
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-26T04:23:25Z
dc.date.available2021-10-26T04:23:25Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31828
dc.sourceIIOimport
dc.titleBottom-up nanoelectronic device fabrication by Area-Selective Deposition
dc.typeOral presentation
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.source.peerreviewno
dc.source.conferenceSciCon 2018
dc.source.conferencedate17/05/2018
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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