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Diffusion-mediated growth and size-fependent nanoparticle reactivity during ruthenium atomic layer deposition on dielectric substrates

dc.contributor.authorSoethoudt, Job
dc.contributor.authorGrillo, Fabio
dc.contributor.authorMarques, Esteban
dc.contributor.authorVan Ommen, Ruud
dc.contributor.authorTomczak, Yoann
dc.contributor.authorNyns, Laura
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-26T04:24:06Z
dc.date.available2021-10-26T04:24:06Z
dc.date.issued2018
dc.identifier.issn2196-7350
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31829
dc.sourceIIOimport
dc.titleDiffusion-mediated growth and size-fependent nanoparticle reactivity during ruthenium atomic layer deposition on dielectric substrates
dc.typeJournal article
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorMarques, Esteban
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage1800870
dc.source.journalAdvanced Materials Interfaces
dc.source.issue24
dc.source.volume5
dc.identifier.urlhttps://onlinelibrary.wiley.com/doi/abs/10.1002/admi.201800870
imec.availabilityPublished - imec


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