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dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorJin, S.
dc.contributor.authorBender, Hugo
dc.contributor.authorMaex, Karen
dc.contributor.authorVantomme, Andre
dc.contributor.authorLangouche, G.
dc.date.accessioned2021-10-06T10:40:54Z
dc.date.available2021-10-06T10:40:54Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3182
dc.sourceIIOimport
dc.titleInfluence of SiGe thickness on the Co/SiGe/Si solid state reaction
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVantomme, Andre
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage151
dc.source.endpage156
dc.source.conferenceAdvanced Interconnects and Contacts
dc.source.conferencedate05/04/1999
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 564


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