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Sequential infiltration synthesis for pattern transfer of sub 20 nm thermal scanning probe lithography patterns

dc.contributor.authorSpiesser, Martin
dc.contributor.authorKulmala, Tero
dc.contributor.authorChan, BT
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorKnoll, Armin
dc.date.accessioned2021-10-26T04:30:36Z
dc.date.available2021-10-26T04:30:36Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31839
dc.sourceIIOimport
dc.titleSequential infiltration synthesis for pattern transfer of sub 20 nm thermal scanning probe lithography patterns
dc.typeMeeting abstract
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.conferenceALD Conference
dc.source.conferencedate29/07/2018
dc.source.conferencelocationIncheon Korea
dc.identifier.urlhttps://ald2018.avs.org/
imec.availabilityPublished - imec


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