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A high performance 0.18µm elevated source/drain technology with improved manufacturability

dc.contributor.authorAugendre, Emmanuel
dc.contributor.authorRooyackers, Rita
dc.contributor.authorVandamme, Ewout
dc.contributor.authorPerello, Carles
dc.contributor.authorVan Dievel, Marc
dc.contributor.authorPochet, Sandrine
dc.contributor.authorBadenes, Gonçal
dc.date.accessioned2021-10-06T10:41:08Z
dc.date.available2021-10-06T10:41:08Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3194
dc.sourceIIOimport
dc.titleA high performance 0.18µm elevated source/drain technology with improved manufacturability
dc.typeProceedings paper
dc.contributor.imecauthorVan Dievel, Marc
dc.source.peerreviewno
dc.source.beginpage636
dc.source.endpage639
dc.source.conferenceESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference
dc.source.conferencedate13/09/1999
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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