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Characterization of porous low-k dielectric films by using positron annihilation

dc.contributor.authorUedono, Akira
dc.contributor.authorArmini, Silvia
dc.contributor.authorKrause-Rehberg, R
dc.contributor.authorWagner, A
dc.date.accessioned2021-10-26T06:08:48Z
dc.date.available2021-10-26T06:08:48Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31989
dc.sourceIIOimport
dc.titleCharacterization of porous low-k dielectric films by using positron annihilation
dc.typeMeeting abstract
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewyes
dc.source.conferenceJAPAN-RUB Workshop on Plasma Science
dc.source.conferencedate4/07/2018
dc.source.conferencelocationRuhr-Universität Bochum Germany
imec.availabilityPublished - imec


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