Authors

van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; van Dijk, Leon; Otten, Ronald; Beyer, Dirk

Conference

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology

Title

Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution

Publication type

Proceedings paper

Embargo date

9999-12-31