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Single step alkaline cleaning solution for advanced semiconductor cleaning

dc.contributor.authorBaeyens, Martien
dc.contributor.authorHub, W.
dc.contributor.authorKolbesen, B. O.
dc.contributor.authorMartin, A.R.
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-06T10:41:28Z
dc.date.available2021-10-06T10:41:28Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3205
dc.sourceIIOimport
dc.titleSingle step alkaline cleaning solution for advanced semiconductor cleaning
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage23
dc.source.endpage26
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vols. 65-66


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