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Characterisation of plasma etch related residues formed on top of ECD Cu

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorConard, Thierry
dc.contributor.authorLanckmans, Filip
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorHolmes, D.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-06T10:41:30Z
dc.date.available2021-10-06T10:41:30Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3206
dc.sourceIIOimport
dc.titleCharacterisation of plasma etch related residues formed on top of ECD Cu
dc.typeOral presentation
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceAdvanced Metallization Conference; 28-30 September 1999; Orlando, FL, USA.
imec.availabilityPublished - imec


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