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Development of a non-destructive thin film porosimetry: pore size distribution and pore volume of porous silica

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorDultsev, F. N.
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorMogilnikov, K. P.
dc.contributor.authorMaex, Karen
dc.contributor.authorWang, Sharon
dc.contributor.authorForester, Lynn
dc.date.accessioned2021-10-06T10:41:32Z
dc.date.available2021-10-06T10:41:32Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3207
dc.sourceIIOimport
dc.titleDevelopment of a non-destructive thin film porosimetry: pore size distribution and pore volume of porous silica
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage507
dc.source.endpage512
dc.source.conferenceAdvanced Metallization Conference in 1998. Proceedings of the Conference;
imec.availabilityPublished - imec


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