Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300

Thumbnail
Metadata
Show full item record
Authors
Van Look, Lieve; Bekaert, Joost; Frommhold, Andreas; Hendrickx, Eric; Rispens, Gijsbert; Schiffelers, Guido
Conference
International Conference on Extreme Ultraviolet Lithography
Title
Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
Publication type
Proceedings paper
Collections