Show simple item record

Low temperature oxidation and selective etching of CVD SiC films

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMannaert, Geert
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-06T10:41:34Z
dc.date.available2021-10-06T10:41:34Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3208
dc.sourceIIOimport
dc.titleLow temperature oxidation and selective etching of CVD SiC films
dc.typeOral presentation
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceAdvanced Metallization Conference; 28-30 September 1999; Orlando, FL, USA.
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record