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Process integration induced thermodesorption from SiO2/SiLK resin dielectric based interconnects
Publication:
Process integration induced thermodesorption from SiO2/SiLK resin dielectric based interconnects
Date
1999
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baklanov, Mikhaïl
;
Muroyama, M.
;
Judelewicz, Moshe
;
Kondoh, Eiichi
;
Li, H.
;
Waeterloos, Joost
;
Vanhaelemeersch, Serge
;
Maex, Karen
Journal
J. Vacuum Science and Technology B
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1932
since deposited on 2021-10-06
Acq. date: 2025-10-23
Citations
Metrics
Views
1932
since deposited on 2021-10-06
Acq. date: 2025-10-23
Citations