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Alternative patterning mechanisms for Extreme Ultraviolet Lithography

dc.contributor.authorVesters, Yannick
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-26T08:42:46Z
dc.date.available2021-10-26T08:42:46Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32209
dc.sourceIIOimport
dc.titleAlternative patterning mechanisms for Extreme Ultraviolet Lithography
dc.typeOral presentation
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference14th Chemistry Conference for Young Scientists - ChemCYS
dc.source.conferencedate21/02/2018
dc.source.conferencelocationBlankenberge Belgium
dc.identifier.urlhttps://www.chemcys.be/index.php/program/accepted-abstracts
imec.availabilityPublished - imec


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