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Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement

dc.contributor.authorVesters, Yannick
dc.contributor.authorJiang, Jing
dc.contributor.authorYamamoto, Hiroki
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorKozawa, Takahiro
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-26T08:43:31Z
dc.date.available2021-10-26T08:43:31Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32210
dc.sourceIIOimport
dc.titleSensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1058307
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2297627
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10583


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