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Self-aligned block and fully self-aligned via for iN5 Metal 2 Self-aligned quadruple patterning

dc.contributor.authorVincent, Benjamin
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorJuncker, Aurelie
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorHalder, Sandip
dc.contributor.authorErvin, Joseph
dc.date.accessioned2021-10-26T08:46:28Z
dc.date.available2021-10-26T08:46:28Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32214
dc.sourceIIOimport
dc.titleSelf-aligned block and fully self-aligned via for iN5 Metal 2 Self-aligned quadruple patterning
dc.typeProceedings paper
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecMurdoch, Gayle::0000-0002-6833-220X
dc.source.peerreviewyes
dc.source.beginpage105830W
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2298761
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10583


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