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Improved ohmic performance by the metallic bilayer contact stack of oxygen-incorporated La/ultrathin TiSi on n-Si

dc.contributor.authorWang, Linlin
dc.contributor.authorYu, Hao
dc.contributor.authorSchaekers, Marc
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorMocuta, Dan
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCollaert, Nadine
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorJiang, Yu-long
dc.date.accessioned2021-10-26T09:06:44Z
dc.date.available2021-10-26T09:06:44Z
dc.date.issued2018
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32242
dc.sourceIIOimport
dc.titleImproved ohmic performance by the metallic bilayer contact stack of oxygen-incorporated La/ultrathin TiSi on n-Si
dc.typeJournal article
dc.contributor.imecauthorYu, Hao
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecYu, Hao::0000-0002-1976-0259
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1869
dc.source.endpage1872
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue5
dc.source.volume65
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8310026/
imec.availabilityPublished - open access


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