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Focused ion beam and transmission electron microscopy for process development

dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-06T10:42:19Z
dc.date.available2021-10-06T10:42:19Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3224
dc.sourceIIOimport
dc.titleFocused ion beam and transmission electron microscopy for process development
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage232
dc.source.endpage247
dc.source.conferenceAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
dc.source.conferencedate16/09/1999
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-16


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