Publication:
Low temperature SiGe steam oxide – aqueous HF and NH3/NF3 remote plasma etching and its implementation as Si GAA inner spacer
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1923 since deposited on 2021-10-26
2last month
1last week
Acq. date: 2025-12-17
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Views
1923 since deposited on 2021-10-26
2last month
1last week
Acq. date: 2025-12-17
Citations