dc.contributor.author | You, Shuzhen | |
dc.contributor.author | Posthuma, Niels | |
dc.contributor.author | Ronchi, Nicolo | |
dc.contributor.author | Stoffels, Steve | |
dc.contributor.author | Bakeroot, Benoit | |
dc.contributor.author | Wellekens, Dirk | |
dc.contributor.author | Liang, Hu | |
dc.contributor.author | Zhao, Ming | |
dc.contributor.author | Decoutere, Stefaan | |
dc.date.accessioned | 2021-10-26T10:19:03Z | |
dc.date.available | 2021-10-26T10:19:03Z | |
dc.date.issued | 2018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32340 | |
dc.source | IIOimport | |
dc.title | Dielectrics choice and processing for low dispersion enhancement mode p-GaN gate HEMTs on 200mm Si substrates | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | You, Shuzhen | |
dc.contributor.imecauthor | Posthuma, Niels | |
dc.contributor.imecauthor | Ronchi, Nicolo | |
dc.contributor.imecauthor | Stoffels, Steve | |
dc.contributor.imecauthor | Bakeroot, Benoit | |
dc.contributor.imecauthor | Wellekens, Dirk | |
dc.contributor.imecauthor | Liang, Hu | |
dc.contributor.imecauthor | Zhao, Ming | |
dc.contributor.imecauthor | Decoutere, Stefaan | |
dc.contributor.orcidimec | Posthuma, Niels::0000-0002-6029-1909 | |
dc.contributor.orcidimec | Ronchi, Nicolo::0000-0002-7961-4077 | |
dc.contributor.orcidimec | Bakeroot, Benoit::0000-0003-4392-1777 | |
dc.contributor.orcidimec | Zhao, Ming::0000-0002-0856-851X | |
dc.contributor.orcidimec | Decoutere, Stefaan::0000-0001-6632-6239 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 28 | |
dc.source.endpage | 29 | |
dc.source.conference | Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe | |
dc.source.conferencedate | 14/05/2018 | |
dc.source.conferencelocation | Bucharest Romania | |
dc.identifier.url | http://www.imt.ro/WOCSDICE2018/Program%20WOCSDICE2018_07.05.2018.pdf | |
imec.availability | Published - imec | |