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Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach

dc.contributor.authorZotovich, Alexey
dc.contributor.authorRezvanov, Askar
dc.contributor.authorChanson, Romain
dc.contributor.authorZhang, L.
dc.contributor.authorHacker, N.
dc.contributor.authorKurchikov, K.
dc.contributor.authorKlimin, S.
dc.contributor.authorZyryanov, S. M.
dc.contributor.authorLopaev, Dimitri
dc.contributor.authorGornev, E.
dc.contributor.authorClemente, I.
dc.contributor.authorMiakonkikh, A.
dc.contributor.authorMaslakov, K.
dc.date.accessioned2021-10-26T10:55:33Z
dc.date.available2021-10-26T10:55:33Z
dc.date.issued2018
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32390
dc.sourceIIOimport
dc.titleLow-k protection from F radicals and VUV photons using a multilayer pore grafting approach
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage325202
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue32
dc.source.volume51
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/1361-6463/aad06d
imec.availabilityPublished - open access


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