Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach
dc.contributor.author | Zotovich, Alexey | |
dc.contributor.author | Rezvanov, Askar | |
dc.contributor.author | Chanson, Romain | |
dc.contributor.author | Zhang, L. | |
dc.contributor.author | Hacker, N. | |
dc.contributor.author | Kurchikov, K. | |
dc.contributor.author | Klimin, S. | |
dc.contributor.author | Zyryanov, S. M. | |
dc.contributor.author | Lopaev, Dimitri | |
dc.contributor.author | Gornev, E. | |
dc.contributor.author | Clemente, I. | |
dc.contributor.author | Miakonkikh, A. | |
dc.contributor.author | Maslakov, K. | |
dc.date.accessioned | 2021-10-26T10:55:33Z | |
dc.date.available | 2021-10-26T10:55:33Z | |
dc.date.issued | 2018 | |
dc.identifier.issn | 0022-3727 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32390 | |
dc.source | IIOimport | |
dc.title | Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach | |
dc.type | Journal article | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 325202 | |
dc.source.journal | Journal of Physics D: Applied Physics | |
dc.source.issue | 32 | |
dc.source.volume | 51 | |
dc.identifier.url | http://iopscience.iop.org/article/10.1088/1361-6463/aad06d | |
imec.availability | Published - open access |