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Study of cobalt wet recess for fully self aligned vias in advanced interconnects

dc.contributor.authorAkanishi, Yuya
dc.contributor.authorPacco, Antoine
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-27T07:25:23Z
dc.date.available2021-10-27T07:25:23Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32416
dc.sourceIIOimport
dc.titleStudy of cobalt wet recess for fully self aligned vias in advanced interconnects
dc.typeMeeting abstract
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorHolsteyns, Frank
dc.source.peerreviewno
dc.source.beginpage4.15
dc.source.conferenceIEEE International Interconnect Technology Conference (IITC 2019) and Materials for Advanced Metallization Conference (MAM 2019)
dc.source.conferencedate3/06/2019
dc.source.conferencelocationBrussels Begium
imec.availabilityPublished - imec


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