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A novel electromigration characterization method based on low-frequency noise measurements

dc.contributor.authorBeyne, Sofie
dc.contributor.authorVarela Pedreira, Olalla
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.date.accessioned2021-10-27T07:34:15Z
dc.date.available2021-10-27T07:34:15Z
dc.date.issued2019
dc.identifier.issn0268-1242
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32538
dc.sourceIIOimport
dc.titleA novel electromigration characterization method based on low-frequency noise measurements
dc.typeJournal article
dc.contributor.imecauthorBeyne, Sofie
dc.contributor.imecauthorVarela Pedreira, Olalla
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage75002
dc.source.journalSemiconductor Science and Technology
dc.source.issue7
dc.source.volume34
dc.identifier.urlhttps://doi.org/10.1088/1361-6641/ab1963
imec.availabilityPublished - open access


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