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Comparative study of rapid and classical thermal phosphorus diffusion in polycrystalline silicon thin films

dc.contributor.authorBourdais, S.
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorSlaoui, A.
dc.contributor.authorPoortmans, Jef
dc.contributor.authorSemmache, B.
dc.contributor.authorDubois, C.
dc.date.accessioned2021-10-06T10:45:12Z
dc.date.available2021-10-06T10:45:12Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3266
dc.sourceIIOimport
dc.titleComparative study of rapid and classical thermal phosphorus diffusion in polycrystalline silicon thin films
dc.typeOral presentation
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewno
dc.source.conferenceInternational Photovoltaic Science and Engineering Conference; September 1999; Sapporo, Japan.
imec.availabilityPublished - imec


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