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Anisotropic etching in (3 1 1) Si to fabricate sharp resorbable polymer microneedles carrying neural electrode arrays

dc.contributor.authorCeyssens, Frederik
dc.contributor.authorWelkenhuysen, Marleen
dc.contributor.authorPuers, Bob
dc.date.accessioned2021-10-27T07:55:48Z
dc.date.available2021-10-27T07:55:48Z
dc.date.issued2019
dc.identifier.issn0960-1317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32675
dc.sourceIIOimport
dc.titleAnisotropic etching in (3 1 1) Si to fabricate sharp resorbable polymer microneedles carrying neural electrode arrays
dc.typeJournal article
dc.contributor.imecauthorCeyssens, Frederik
dc.contributor.imecauthorWelkenhuysen, Marleen
dc.contributor.imecauthorPuers, Bob
dc.contributor.orcidimecWelkenhuysen, Marleen::0000-0001-6729-9391
dc.source.peerreviewyes
dc.source.beginpage27001
dc.source.journalJournal of Micromechanics and Microengineering
dc.source.issue2
dc.source.volume29
dc.identifier.urlhttps://doi.org/10.1088/1361-6439/aaf43a
imec.availabilityPublished - imec


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