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ESD challenges in advanced FinFET and GAA nanowire CMOS technologies

dc.contributor.authorChen, Shih-Hung
dc.date.accessioned2021-10-27T07:59:24Z
dc.date.available2021-10-27T07:59:24Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32693
dc.sourceIIOimport
dc.titleESD challenges in advanced FinFET and GAA nanowire CMOS technologies
dc.typeProceedings paper
dc.contributor.imecauthorChen, Shih-Hung
dc.source.peerreviewyes
dc.source.conference2019 IEEE Custom Integrated Circuits Conference (CICC)
dc.source.conferencedate14/04/2019
dc.source.conferencelocationAustin, TX USA
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8780136
imec.availabilityPublished - imec


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