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Fabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies

dc.contributor.authorCollaert, Nadine
dc.contributor.authorAlian, AliReza
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorPeralagu, Uthayasankaran
dc.contributor.authorVais, Abhitosh
dc.contributor.authorWalke, Amey
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorYu, Hao
dc.contributor.authorCapogreco, Elena
dc.contributor.authorDevriendt, Katia
dc.contributor.authorHopf, Toby
dc.contributor.authorKenis, Karine
dc.contributor.authorMannaert, Geert
dc.contributor.authorMilenin, Alexey
dc.contributor.authorPeter, Antony
dc.contributor.authorSebaai, Farid
dc.contributor.authorTeugels, Lieve
dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorWostyn, Kurt
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorWaldron, Niamh
dc.date.accessioned2021-10-27T08:08:26Z
dc.date.available2021-10-27T08:08:26Z
dc.date.issued2019-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32733
dc.sourceIIOimport
dc.titleFabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies
dc.typeProceedings paper
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorPeralagu, Uthayasankaran
dc.contributor.imecauthorVais, Abhitosh
dc.contributor.imecauthorWalke, Amey
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorYu, Hao
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorHopf, Toby
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecPeralagu, Uthayasankaran::0000-0001-9166-4408
dc.contributor.orcidimecVais, Abhitosh::0000-0002-0317-7720
dc.contributor.orcidimecYu, Hao::0000-0002-1976-0259
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpage1096305
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VIII
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://doi.org/10.1117/12.2511746
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10963


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