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A Novel Volatile Film for Dielectric Plasma Damage Protection

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorRezvanov, Askar
dc.contributor.authorChanson, Romain
dc.contributor.authorBabaei Gavan, Khashayar
dc.contributor.authorFujikawa, M.
dc.contributor.authorYamaguchi, T.
dc.contributor.authorNozawa, S.
dc.contributor.authorKikuchi, Y.
dc.contributor.authorMaekawa, K.
dc.date.accessioned2021-10-27T08:25:51Z
dc.date.available2021-10-27T08:25:51Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32806
dc.sourceIIOimport
dc.titleA Novel Volatile Film for Dielectric Plasma Damage Protection
dc.typeMeeting abstract
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorBabaei Gavan, Khashayar
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology Workshop - PESM
dc.source.conferencedate20/05/2019
dc.source.conferencelocationGrenoble France
dc.identifier.urlhttp://pesm2019.insight-outside.fr/
imec.availabilityPublished - imec


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