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The hidden energy tail of low energy electrons in EUV lithography

dc.contributor.authorFallica, Roberto
dc.contributor.authorRezvani, Seyed Javid
dc.contributor.authorNannarone, Stefano
dc.contributor.authorBorisov, Sergei
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorBabin, Sergey
dc.contributor.authorLorusso, Gian
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-27T09:08:19Z
dc.date.available2021-10-27T09:08:19Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32948
dc.sourceIIOimport
dc.titleThe hidden energy tail of low energy electrons in EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1096009
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVI
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan José California
dc.identifier.urlhttps://doi.org/10.1117/12.2514998
imec.availabilityPublished - imec
imec.internalnotesSPIE Proceedings Volume 10960


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