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Chemical vapor deposition of monolayer-thin WS2 crystals from the WF6 and H2S precursors at low temperature

dc.contributor.authorGroven, Benjamin
dc.contributor.authorClaes, Dieter
dc.contributor.authorNalin Mehta, Ankit
dc.contributor.authorBender, Hugo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.authorRadu, Iuliana
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-27T09:50:13Z
dc.date.available2021-10-27T09:50:13Z
dc.date.issued2019
dc.identifier.issn0021-9606
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33063
dc.sourceIIOimport
dc.titleChemical vapor deposition of monolayer-thin WS2 crystals from the WF6 and H2S precursors at low temperature
dc.typeJournal article
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorClaes, Dieter
dc.contributor.imecauthorNalin Mehta, Ankit
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecNalin Mehta, Ankit::0000-0002-2169-940X
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewyes
dc.source.beginpage104703
dc.source.journalJournal of Chemical Physics
dc.source.issue10
dc.source.volume150
dc.identifier.urlhttps://aip.scitation.org/doi/full/10.1063/1.5048346
imec.availabilityPublished - imec


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