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Aspect ratio independent Plasma etching for silicon STI

dc.contributor.authorHan, Yang
dc.contributor.authorZhang, Liping
dc.contributor.authorAltamirano Sanchez, Efrain
dc.date.accessioned2021-10-27T10:01:25Z
dc.date.available2021-10-27T10:01:25Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33091
dc.sourceIIOimport
dc.titleAspect ratio independent Plasma etching for silicon STI
dc.typeMeeting abstract
dc.contributor.imecauthorHan, Yang
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.source.peerreviewyes
dc.source.conference2019 Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate20/05/2019
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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