dc.contributor.author | He, Liang | |
dc.contributor.author | Zhao, Pan | |
dc.contributor.author | Liu, Jiahao | |
dc.contributor.author | Su, Yahui | |
dc.contributor.author | Chen, Hua | |
dc.contributor.author | Jia, Xiaofei | |
dc.contributor.author | Arimura, Hiroaki | |
dc.contributor.author | Mitard, Jerome | |
dc.contributor.author | Witters, Liesbeth | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Collaert, Nadine | |
dc.contributor.author | Claeys, Cor | |
dc.contributor.author | Simoen, Eddy | |
dc.date.accessioned | 2021-10-27T10:10:24Z | |
dc.date.available | 2021-10-27T10:10:24Z | |
dc.date.issued | 2019-12 | |
dc.identifier.issn | 0018-9383 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33114 | |
dc.source | IIOimport | |
dc.title | Gate metal and cap layer effects on Ge nMOSFETs low frequency noise behavior | |
dc.type | Journal article | |
dc.contributor.imecauthor | Arimura, Hiroaki | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.imecauthor | Witters, Liesbeth | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Collaert, Nadine | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.contributor.orcidimec | Collaert, Nadine::0000-0002-8062-3165 | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1050 | |
dc.source.endpage | 1056 | |
dc.source.journal | IEEE Transactions on Electron Devices | |
dc.source.issue | 2 | |
dc.source.volume | 66 | |
dc.identifier.url | https://ieeexplore.ieee.org/document/8570775 | |
imec.availability | Published - open access | |