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Observation of plasma-induced damage in bulk germanium p-type FinFET devices and curing in high-pressure anneal

dc.contributor.authorHiblot, Gaspard
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorChiu, Eddie
dc.contributor.authorLiu, Yefan
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCollaert, Nadine
dc.contributor.authorVan der Plas, Geert
dc.date.accessioned2021-10-27T10:27:01Z
dc.date.available2021-10-27T10:27:01Z
dc.date.issued2019
dc.identifier.issn1530-4388
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33156
dc.sourceIIOimport
dc.titleObservation of plasma-induced damage in bulk germanium p-type FinFET devices and curing in high-pressure anneal
dc.typeJournal article
dc.contributor.imecauthorHiblot, Gaspard
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorLiu, Yefan
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVan der Plas, Geert
dc.contributor.orcidimecHiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.source.peerreviewyes
dc.source.beginpage468
dc.source.endpage470
dc.source.journalIEEE Transactions on Device and Materials Reliability
dc.source.issue2
dc.source.volume19
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8672823
imec.availabilityPublished - imec


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