Show simple item record

Enabling complimentary FET (CFET) fabrication: selective, isotropic etch of Group IV semiconductors

dc.contributor.authorKal, Subhadeep
dc.contributor.authorOniki, Yusuke
dc.contributor.authorFalugh, Matthew
dc.contributor.authorPereira, Cheryl
dc.contributor.authorWang, Qi
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorSmith, Jeffrey
dc.contributor.authorMosden, Aelan
dc.contributor.authorKumar, Kaushik
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorRyckaert, Julien
dc.contributor.authorBiolsi, Peter
dc.contributor.authorHurd, Trace Q
dc.date.accessioned2021-10-27T11:02:08Z
dc.date.available2021-10-27T11:02:08Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33236
dc.sourceIIOimport
dc.titleEnabling complimentary FET (CFET) fabrication: selective, isotropic etch of Group IV semiconductors
dc.typeMeeting abstract
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.source.peerreviewyes
dc.source.beginpage109630L
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VIII
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2514741
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10963


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record