Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect

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Authors
Kesters, Els; Ohashi, Takuya; Wada, Y; Sugawara, M; Kumagai, T; Le, Quoc Toan; Rip, Jens; Oniki, Yusuke; Holsteyns, Frank
Conference
The Surface Preparation and Cleaning Conference (SPCC) 2019
Title
Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect
Publication type
Meeting abstract
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