dc.contributor.author | Kosma, Vasiliki | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Vandenberghe, Geert | |
dc.date.accessioned | 2021-10-27T11:41:43Z | |
dc.date.available | 2021-10-27T11:41:43Z | |
dc.date.issued | 2019 | |
dc.identifier.issn | 0914-9244 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33321 | |
dc.source | IIOimport | |
dc.title | Metal based materials for EUV lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Kosma, Vasiliki | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.date.embargo | 9999-12-31 | |
dc.identifier.doi | 10.3390/ma12132124 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 179 | |
dc.source.endpage | 183 | |
dc.source.journal | Journal of Photopolymer Science and Technology | |
dc.source.issue | 1 | |
dc.source.volume | 32 | |
dc.identifier.url | https://doi.org/10.2494/photopolymer.32.179 | |
imec.availability | Published - open access | |
imec.internalnotes | paper from the 36th International Conference of Photopolymer Science and Technology, June 2019, Chiba, Japan | |