Show simple item record

Metal based materials for EUV lithography

dc.contributor.authorKosma, Vasiliki
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-27T11:41:43Z
dc.date.available2021-10-27T11:41:43Z
dc.date.issued2019
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33321
dc.sourceIIOimport
dc.titleMetal based materials for EUV lithography
dc.typeJournal article
dc.contributor.imecauthorKosma, Vasiliki
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.identifier.doi10.3390/ma12132124
dc.source.peerreviewyes
dc.source.beginpage179
dc.source.endpage183
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue1
dc.source.volume32
dc.identifier.urlhttps://doi.org/10.2494/photopolymer.32.179
imec.availabilityPublished - open access
imec.internalnotespaper from the 36th International Conference of Photopolymer Science and Technology, June 2019, Chiba, Japan


Files in this item

Thumbnail
Name:
43195.pdf
Size:
1.530Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record