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Multi-Patterning Options for 5nm and Below_SADP, SAQP, SALELE

dc.contributor.authorLee, Jae Uk
dc.contributor.authorApoorva, Oak
dc.contributor.authorRyoung han, Kim
dc.contributor.authorDavid, Abercrombie
dc.contributor.authorRehab, Kotb Ali
dc.contributor.authorAhmed, Hamed-Fatehy
dc.date.accessioned2021-10-27T12:13:27Z
dc.date.available2021-10-27T12:13:27Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33388
dc.sourceIIOimport
dc.titleMulti-Patterning Options for 5nm and Below_SADP, SAQP, SALELE
dc.typeJournal article
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.source.peerreviewno
dc.source.journalWhite paper on Mentor graphics
dc.identifier.urlhttps://go.mentor.com/55TT4
imec.availabilityPublished - imec


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