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Ultra-long-term reliable ensapsulation using an atomic layer deposited HfO2/Al2O3/HfO2 triple-interlayer for biomedical implant

dc.contributor.authorLi, Changzheng
dc.contributor.authorCauwe, Maarten
dc.contributor.authorYang, Yang
dc.contributor.authorSchaubroeck, David
dc.contributor.authorMader, Lothar
dc.contributor.authorOp de Beeck, Maaike
dc.date.accessioned2021-10-27T12:27:10Z
dc.date.available2021-10-27T12:27:10Z
dc.date.issued2019
dc.identifier.issn2079-6412
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33416
dc.sourceIIOimport
dc.titleUltra-long-term reliable ensapsulation using an atomic layer deposited HfO2/Al2O3/HfO2 triple-interlayer for biomedical implant
dc.typeJournal article
dc.contributor.imecauthorLi, Changzheng
dc.contributor.imecauthorCauwe, Maarten
dc.contributor.imecauthorSchaubroeck, David
dc.contributor.imecauthorMader, Lothar
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.orcidimecCauwe, Maarten::0000-0002-6413-998X
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage579
dc.source.journalCoatings
dc.source.issue9
dc.source.volume9
dc.identifier.urlhttps://doi.org/10.3390/coatings9090579
imec.availabilityPublished - open access


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